| 摘要 |
PURPOSE:To obtain a standard sample which makes possible the exact control of a pulverous particle measuring imstrument by sticking pulverous particles to a substrate and covering the particle-sticking surface with a transparent film. CONSTITUTION:The standard sample is prepd. by sticking the pulverous particles 2 onto the semiconductor substrate 1 and covering the particle-sticking surface thereof with the transparent film 5. The substrate 1 is, for example, a silicon wafer and the pulverous particles 2 are, for example, abrasive particles of SiO2. The transparent film 5 is obtd. by coating a polyamic acid by using a coating machine called spinner and baking the same for the prescribed time in an N2 atmosphere kept at a prescribed temp. to polymerize the polyamic acie thereby forming the transparent polyamide film to about 2mum on the abrasive SiO2 particle-sticking surface. The same number of particles and distribution conditions are thereby obtd. simply by washing and therefore the exact control of the pulverous particle measuring instrument is made possible. |
