| 摘要 |
PURPOSE:To ensure that application of a photoresist, development, post-baking associated therewith and removal of the photoresist are required to be completed by only one time, by changing the light exposure in using two masks for conducting exposure in a step after providing a conductor layer. CONSTITUTION:A resistor layer 2 is provided on a substrate 1, and the conductor layer 3 is provided thereon. A photoresist 8 is applied to the layer 3. Then exposure to light is conducted through a mask 5 having a comb-shaped light- shielding pattern 4 and then through a mask 7 having an elongate light- transmitting pattern 6. Development and post-baking are conducted. The exposure to light through the mask 7 is carried out with such a light exposure that a part of the resist is left at the time of the development, whereby a groove 9 is provided at a part corresponding to the pattern 6, and a thin layer of photoresist H is left. The exposure to light through the mask 5 is carried out with such a large light exposure that no resist is left at exposed parts at the time of development, whereby the photoresist at parts other than the parts corresponding to the pattern 4 is removed, and grooves 10 are provided. |
