发明名称 METHOD FOR REMOVING COPPER IN WASTE CHEMICAL COPPER PLATING LIQUID
摘要 PURPOSE:To effectively function a neutralizing and flocculating device of a post stage by adding hydrogen peroxide and ferrous salt to a waste chemical copper plating liquid contg. a complexing agent and copper to decompose the complexing agent by oxidation then depositing the liberated copper as the hydroxide. CONSTITUTION:The hydrogen peroxide is added to the waste chemical copper plating liquid contg. the complexing agent and copper at 3-5 times the weight of the complexing agent and the ferrous salt is added thereto at 5-7 times the weight of the oxygen in the hydrogen perioxide and after the complexing agent is decomposed by oxidation under the condition of 3-5pH, the copper is deposited as the copper hydroxide at >=10pH. As a result, the neutralizing and flocculating device of the post stage can be commonly used with the other waste water system and therefore the device is not complex and is economical. The need for an installation for treating COD components is eliminated even if this method is applied independently to the waste chemical copper plating liquid system.
申请公布号 JPS624492(A) 申请公布日期 1987.01.10
申请号 JP19850141900 申请日期 1985.06.28
申请人 HITACHI PLANT ENG & CONSTR CO LTD 发明人 SATO HITOSHI;KATAOKA MASAHARU
分类号 C02F1/62;C02F1/72 主分类号 C02F1/62
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