| 摘要 |
PURPOSE:To obtain the magnetic layer of the titled head with the reduced resistance of a conductor layer and having an excellent magnetic characteristic by forming the magnetic layer with a single-layered magnetic film obtained by ion etching and the succeeding lift off method to reduce the level difference. CONSTITUTION:The pattern of a photoresist 2 is formed on a substrate 1 to cover the part other than the desired shape part and then the magnetic film 3 is deposited by a sputtering device. Then the pattern of the photoresist 4 is formed by ion etching so that the vicinity of the gap part of the magnetic layer is made thinner than other parts, and the magnetic film 3 is then etched to a desired depth. Then the resist 2 is removed by a release agent or an org. solvent and the magnetic film 3 on the part other than the desired shape is simultaneously removed. Consequently, the single-layered magnetic film 3 is formed, the level difference is reduced, the resistance of the conductor layer is decreased,and the electrical characteristic of the magnetic head is improved. |
