发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To prevent the deformation of a pattern shape due to thermosetting at a base part caused by temperature increase when evaporated metal is formed, by using an imide resin at the base part for an air bridge. CONSTITUTION:In forming processes of an air bridge pattern, the shape and the height of a base part for the air bridge are stably provided. An imide resin 6 is used in place of photoresist at the base part for the air bridge so that the resin can be readily dissolved even if the temperature of a substrate 1 is increased when evaporated metal 4 is formed. Since the base part for the air bridge is formed with the imide resin 6, the pattern shape is not deformed even if the heat resistance of the imide resin 6 is increased to the temperature of 200 deg.C by adding a curing process. The resin is readily dissolved in the treatment with a releasing liquid.
申请公布号 JPS62181446(A) 申请公布日期 1987.08.08
申请号 JP19860024308 申请日期 1986.02.04
申请人 MITSUBISHI ELECTRIC CORP 发明人 MATSUOKA TAKASHI;AONO KOJI
分类号 H01L23/522;H01L21/768 主分类号 H01L23/522
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