CHEMICAL COATING OF MICROWELL FOR ELECTROCHEMICAL DETECTION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of fabricating a chemical detection device.SOLUTION: The method may comprise forming a microwell above a CMOS device. The microwell may comprise a bottom surface and sidewalls. The method may further comprise: applying a first chemical to be selectively attached to the bottom surface of the microwell; forming a metal oxide layer on the sidewalls of the microwell; and applying a second chemical to be selectively attached to the sidewalls of the microwell. The second chemical may lack an affinity to the first chemical.SELECTED DRAWING: Figure 1