| 摘要 |
<p>A novel semi-wet or wet-type agent for treating a waste gas in the semiconductor industry is obtained by impregnating a solid alkaline earth metal hydroxide (eg calcium hydroxide) with an aqueous solution of an alkali metal hydroxide (eg potassium hydroxide) to such an extent that said alkaline earth metal hydroxide becomes wet. The waste gas treating agent does not deteriorate with time and is capable of making harmless waste gases discharged from semiconductor manufacturing apparatuses in the seimicondutor industry, such as volatile inorganic hydrides, e.g., arsine, phosphine and silane, and volatile inorganic halides, e.g., dichlorosilane, boron trifluoride and boron trichloride. The treating agent typically includes 15 to 35% weight of water and 3 to 8% by weight of the alkali metal hydroxide.</p> |
