Radiation-curable resins, process for their preparation, and their use

摘要

The invention relates to radiation-curable resins prepared by reacting hydroxymethylated phenols with diglycidyl ethers of bisphenols and esterification of the reaction products by means of acid esters of ethylenically unsaturated acids. These resins are suitable as photoresists for integrated circuits and for the production of printed multilayer wiring (circuitry, metallisation).