| 摘要 |
PURPOSE:To obtain the titled mask having the high quality by using a film which has a high etching speed and is composed of a nitrided metal silicide for a shading film of the photomask, thereby improving the sticking property to a transparent substrate, and facilitating a dry etching, and improving the etching speed of the shading film. CONSTITUTION:At least the film 3 which has the high dry etching speed and is composed of the nitrided metal silicide, is used for the shading film formed on a transparent substrate 1. Thus, the nitrided metal silicide 3 improves the dry etching speed of the whole shading films 2a, 3 and 2b, and has an effect of facilitating the dry etching. and, the nitrided metal silicide 3 is not injured the inherent characteristic about the good sticking property to the transparent substrate. |
