| 摘要 |
PURPOSE:To industrially and advantageously obtain the subject compound useful as a raw material for polysulfones, polyether sulfones, etc., through one-stage reaction under mild conditions, by reacting a halogenated benzene with a halogenated sulfonic acid in the presence of a Lewis acid. CONSTITUTION:A halogenated benzene is reacted with a halogenated sulfonic acid, such as FSO3H or ClSO3H, having a high acid strength in the presence of a Lewis acid, such as SbF5 or SbCl5, to industrially and readily afford the subject compound useful also as a raw material for epoxy curing agents, medicines, agricultural chemicals, etc., in high yield under mild conditions of ordinary temperature and pressure through one-stage reaction without forming isomers as a by-product. Furthermore, since the acid strength of a superstrong acid obtained by mixing the halogenated sulfonic acid with the Lewis acid, such as antimony halide, is >=100 times based on 100% sulfuric acid and XSO2<+> (X is halogen) is stably present in the above-mentioned superstrong acid system to perform electrophilic attack on aromatic compounds, the afore-mentioned reaction which cannot be carried out in conventional sulfuric acid or ClSO3H is practicable. |
