| 摘要 |
PURPOSE:To improve the sensitivity of the title composition at the time of using the composition for lithography, and the allowability of the composition against an alkaline development condition at the time of developing it by incorporating an alkali soluble resin having silyl ether group, a specified diazohomotetramic acid derivative and a compd. capable of generating an acid by irradiating active rays in the composition. CONSTITUTION:The composition is composed of the alkali-soluble resin having the silyl ether group, the diazohomotetramic acid derivative shown by formula I and the compd. capable of generating the acid by irradiating the active rays. In formula I, R1 is a n-valent org. group, (n) is an integer of 1-6. And, the alkali-soluble resin is released a SiO bond in the presence of the acid, and formed a hydroxyl group. As the result, the solubility of the resin for an alkaline aqueous solution increases. And, the diazohomotetramic acid derivative acts as a retarding agent fore the alkali solubility of the composition. Thus, the composition has the high sensitivity for the lithography using a deep UV ray and an excimer laser as a light source, and the excellent allowability against the alkali development. |
