发明名称 |
A MEANS TO DECOUPLE THE DIFFUSION AND SOLUBILITY SWITCH MECHANISMS OF PHOTORESISTS |
摘要 |
Embodiments of the invention include photoresist materials and methods of patterning photoresist materials. In an embodiment a photoresist material comprises a plurality of molecular glasses (MGs). In an embodiment, a glass transition temperature Tg of the photoresist material is less than an activation temperature needed to deblock blocking groups from the MGs. Embodiments include a method of patterning a photoresist material that comprises exposing the photoresist material with ultraviolet radiation. The method may also comprise, performing a first post exposure bake at a first temperature, that is less than the activation temperature needed to deblock blocking groups from the MGs, and performing a second post exposure bake at a second temperature that is approximately equal to or greater than the activation temperature needed to deblock blocking groups from the MGs. |
申请公布号 |
WO2016190887(A1) |
申请公布日期 |
2016.12.01 |
申请号 |
WO2015US33060 |
申请日期 |
2015.05.28 |
申请人 |
INTEL CORPORATION |
发明人 |
KRYSAK, Marie;BRISTOL, Robert Lindsey;NYHUS, Paul Anton;LEESON, Michael J. |
分类号 |
G03F7/004;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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