PROCESS FOR MAKING RESISTOR LAYER, PRIMARILY FOR OHMIC TYPE HEAT PRODUCING RESISTORS

摘要

A photo-soln. of tenside propyl- and ethyl alcohol, Rh chloride and Cl- Br- Ag, phenosaphrine and/or azocyanide sensitive material. The intricate surface is degreased with phosphoric acid before application of the Pd-Rh-Cl soln.(Dwg.0/0)