发明名称 POSITIVE TYPE PHOTOSENSITIVE RESINOUS COMPOSITION
摘要 of the disclosure A positive type photosensitive resinous composition comprising a binder resin and a quinone diazide compound, the binder resin being a copolymer of (a) at least one phosphoric acid ester monomer represented by the formula: (b) at least one acid group containing .alpha.,.beta.-ethylenically unsaturated monomer, and (c) other copolymerizable .alpha.,.beta.-ethylenically unsaturated monomers than (a) and (b), which is specifically useful for the formation of resist coating in the preparation of printed circuit board.
申请公布号 CA2024482(A1) 申请公布日期 1991.03.02
申请号 CA19902024482 申请日期 1990.08.31
申请人 NIPPON PAINT CO., LTD. 发明人 SEIO, MAMORU;IKEDA, TAKESHI;SAKURAI, KIYOMI
分类号 G03F7/039;C08K3/10;C08L33/14;G03F7/023;(IPC1-7):G03F7/016;C08F220/02;G03F7/027 主分类号 G03F7/039
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