CVD process for coating plastics - by depositing substrate from silane and oxygen enriched with ozone

摘要

In a chemical vapour deposition process for material deposition on a substrate from the gas phase, a gas contg. O2 enriched with O3 and a second gas contg. a Si donor, e.g. silane are separately fed to a nozzle (9) and escape from outlets (11) of a gas shower. Process temp. is in the range from room temp. to 140 deg.C and pressure is in the range from 0.2 mbar to atmos. pressure. The substrate (5) is of plastic, which is coated with Si02. ADVANTAGE - Suitable process for coating plasters.