| 摘要 |
PURPOSE:To prevent a proximity effect resulting from remnant charges and pattern strain by previously forming a position, to which a resist layer is not shaped, to the surface of the outer edge section of a mask blank and exposing the resist layer by electron beams while an electrode for grounding is brought into contact with the position. CONSTITUTION:At least one or more of positions 9, to which resist layers are not formed, are formed previously outside a pattern forming prearranged position 10 in the surface of a blank block 5. Electron beams EB are projected to the surface of the resist layer 4 while electrodes 7 for grounding are brought into contact with Cr oxide layers 3 exposed to the positions 9 by pressure to expose a circuit pattern. According to the method, since the electrodes 7 are brought into contact with the layers 3, charged electric charges do not remain in a layer 4, the layers 3 and a layer 2 and escape to the ground through the electrodes 7, thus resulting in no possiblity in which defective patterns are generated. |
