发明名称 |
Temperature control system for semiconductor wafer or substrate. |
摘要 |
A temperature control system may be used in conjunction with the sputtering. CVD, etching, and like processes for a substrate (1) on which the semiconductor devices are implemented. This system responds quickly to any change in the temperature of the substrate (1) being processed, by heating or cooling the substrate (1) to the appropriate temperature and maintaining it at its constant temperature. <IMAGE>
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申请公布号 |
EP0451740(A2) |
申请公布日期 |
1991.10.16 |
申请号 |
EP19910105469 |
申请日期 |
1991.04.06 |
申请人 |
ANELVA CORPORATION |
发明人 |
NAKAGAWA, TOSHIYUKI, C/O ANELVA CORPORATION;TAKAHASHI, NOBUYUKI, C/O ANELVA CORPORATION;AKIMOTO, TAKASHI |
分类号 |
H01L21/00;H01L21/683 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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