| 发明名称 |
POSITIVE RESIST COMPOSITION |
| 摘要 |
A positive resist composition comprising a radiation-sensitive compound and an alkali-soluble resin which is obtainable by a condensation reaction of na aldehyde and a specific hydroxyl group-containing compound can improve heat resistance without deterioration of sensitivity and film thickness retention.
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| 申请公布号 |
CA2042788(A1) |
申请公布日期 |
1991.12.06 |
| 申请号 |
CA19912042788 |
申请日期 |
1991.05.16 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
UETANI, YASUNORI;OSAKI, HARUYOSHI;TAKEYAMA, NAOKI |
| 分类号 |
C08G8/20;G03F7/023;(IPC1-7):G03F7/008 |
主分类号 |
C08G8/20 |
| 代理机构 |
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