发明名称 METHOD FOR THE PRODUCTION AND DESIGN OF A MINIATURE SEMI-CONDUCTOR PRESSURE SENSOR
摘要 Semiconductor pressure sensor equipped with a diaphragm and a penetration area situated on the same side of a base, characterized in that it has at least one diaphragm (13) covering the sensor reference chamber (15), whereas the said diaphragm is made of silicon nitride, and on the diaphragm there is at least one plate (24) of connected in parallel condensers sensitive to pressure changes, and the plates (24) are deformed together with the diaphragm (13), whereas at least one penetration area (12) located directly at the diaphragm (13) is separated from the said diaphragm (13) with a piece of polysilicon layer (10).<IMAGE>
申请公布号 PL158922(B1) 申请公布日期 1992.10.30
申请号 PL19890278858 申请日期 1989.04.14
申请人 发明人
分类号 G01L9/00;G01L9/12;H01L27/00;(IPC1-7):G01L9/12 主分类号 G01L9/00
代理机构 代理人
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