发明名称 |
METHOD FOR DEPOSITION OF A METAL |
摘要 |
A method for depositing a metal originating from a metal precursor upon a suitable substrate comprises transporting via a carrier gas precursor material, vaporized from said precursor, to said substrate, wherein said carrier is loaded at a certain temperature with said precursor material by flowing through a liquid which contains said precursor normally solid at said temperature. |
申请公布号 |
WO9303196(A1) |
申请公布日期 |
1993.02.18 |
申请号 |
WO1992EP01744 |
申请日期 |
1992.07.28 |
申请人 |
SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. |
发明人 |
FRIGO, DARIO, MARCELLO;GAL, ANTONIUS, WILHELMUS |
分类号 |
C23C16/30;C23C16/44;C23C16/448;C23C16/455;C30B25/02;C30B25/14 |
主分类号 |
C23C16/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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