发明名称 Electronic device and method for fabricating the same
摘要 The disclosed technology provides an electronic device and a fabrication method thereof, in which an etching margin in formation of a variable resistance element is secured and process difficulty is reduced. An electronic device according to an implementation includes a semiconductor memory, the semiconductor memory including: a variable resistance element including a stack of a first magnetic layer, a tunnel barrier layer and a second magnetic layer; a contact plug coupling a top of the variable resistance element and including a magnetism correcting layer; and a conductive line coupled to the variable resistance element through the contact plug including the magnetism correcting layer.
申请公布号 US9508921(B2) 申请公布日期 2016.11.29
申请号 US201414444952 申请日期 2014.07.28
申请人 SK hynix Inc. 发明人 Dong Cha-Deok;Park Ki-Seon
分类号 H01L29/82;H01L43/08;H01L27/22;G11C11/16 主分类号 H01L29/82
代理机构 Perkins Coie LLP 代理人 Perkins Coie LLP
主权项 1. An electronic device comprising a semiconductor memory, the semiconductor memory comprising: a variable resistance element including a stack including a first magnetic layer having a variable magnetization, a tunnel barrier layer, and a second magnetic layer having a pinned magnetization; a contact plug coupling a top of the variable resistance element and including a magnetism correcting layer that produces a magnetic field at the variable resistance element to reduce an influence of a magnetic field of the second magnetic layer on the first magnetic layer; and a conductive line coupled to the variable resistance element through the contact plug including the magnetism correcting layer.
地址 Icheon-Si KR