发明名称 |
Electronic device and method for fabricating the same |
摘要 |
The disclosed technology provides an electronic device and a fabrication method thereof, in which an etching margin in formation of a variable resistance element is secured and process difficulty is reduced. An electronic device according to an implementation includes a semiconductor memory, the semiconductor memory including: a variable resistance element including a stack of a first magnetic layer, a tunnel barrier layer and a second magnetic layer; a contact plug coupling a top of the variable resistance element and including a magnetism correcting layer; and a conductive line coupled to the variable resistance element through the contact plug including the magnetism correcting layer. |
申请公布号 |
US9508921(B2) |
申请公布日期 |
2016.11.29 |
申请号 |
US201414444952 |
申请日期 |
2014.07.28 |
申请人 |
SK hynix Inc. |
发明人 |
Dong Cha-Deok;Park Ki-Seon |
分类号 |
H01L29/82;H01L43/08;H01L27/22;G11C11/16 |
主分类号 |
H01L29/82 |
代理机构 |
Perkins Coie LLP |
代理人 |
Perkins Coie LLP |
主权项 |
1. An electronic device comprising a semiconductor memory,
the semiconductor memory comprising: a variable resistance element including a stack including a first magnetic layer having a variable magnetization, a tunnel barrier layer, and a second magnetic layer having a pinned magnetization; a contact plug coupling a top of the variable resistance element and including a magnetism correcting layer that produces a magnetic field at the variable resistance element to reduce an influence of a magnetic field of the second magnetic layer on the first magnetic layer; and a conductive line coupled to the variable resistance element through the contact plug including the magnetism correcting layer. |
地址 |
Icheon-Si KR |