发明名称 |
ALUMINIUM NITRIDE SUBSTRATE AND METHOD FOR PRODUCING SAME |
摘要 |
In the field of insulating substrates useful for semiconductor devices, a laser-subdivided aluminium nitride substrate has a re-solidified layer formed at the laser score lines comprising oxide, nitride and/or oxynitride of (i) aluminium and/or of (ii) metal additive(s) of said aluminium nitride substrate. In a method of modifying an aluminium nitride substrate the substrate is laser-scored, a heat treatment step is carried out at about 1000 DEG C to 1800 DEG C, and the substrate is then metallised. The modified aluminium nitride substrate can exhibit desired withstand-voltage characteristics. |
申请公布号 |
KR930006124(B1) |
申请公布日期 |
1993.07.07 |
申请号 |
KR19890013381 |
申请日期 |
1989.09.12 |
申请人 |
TOSHIBA CO., LTD. |
发明人 |
SATO, HIDEKI;SUGIURA, YASUYUKI |
分类号 |
C04B41/00;C04B41/51;C04B41/80;C04B41/88;H01L23/15;H05K1/03;H05K3/00;(IPC1-7):C23C30/00 |
主分类号 |
C04B41/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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