发明名称 ALUMINIUM NITRIDE SUBSTRATE AND METHOD FOR PRODUCING SAME
摘要 In the field of insulating substrates useful for semiconductor devices, a laser-subdivided aluminium nitride substrate has a re-solidified layer formed at the laser score lines comprising oxide, nitride and/or oxynitride of (i) aluminium and/or of (ii) metal additive(s) of said aluminium nitride substrate. In a method of modifying an aluminium nitride substrate the substrate is laser-scored, a heat treatment step is carried out at about 1000 DEG C to 1800 DEG C, and the substrate is then metallised. The modified aluminium nitride substrate can exhibit desired withstand-voltage characteristics.
申请公布号 KR930006124(B1) 申请公布日期 1993.07.07
申请号 KR19890013381 申请日期 1989.09.12
申请人 TOSHIBA CO., LTD. 发明人 SATO, HIDEKI;SUGIURA, YASUYUKI
分类号 C04B41/00;C04B41/51;C04B41/80;C04B41/88;H01L23/15;H05K1/03;H05K3/00;(IPC1-7):C23C30/00 主分类号 C04B41/00
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