A process of radiation-induced formation of a uniform metal or metal oxide region suitable for device application or for repairing transparent defects in pattern metal films of lithographic masks has been found. The process requires that the heat evolved during the radiation-induced reactions be carefully limited to produce the desired uniformity.
申请公布号
US5230970(A)
申请公布日期
1993.07.27
申请号
US19920890047
申请日期
1992.05.28
申请人
AT&T BELL LABORATORIES
发明人
ATWOOD, DONALD K.;FISANICK, GEORGIA J.;GROSS, MICHAL E.;KATZIR, ABRAHAM;WOLK, GARY L.