| 发明名称 |
Radio frequency induction plasma processing system utilizing a uniform field coil |
| 摘要 |
A plasma processing apparatus comprising: a chamber for supporting a workpiece; an inlet for introducing a gas into the chamber; a coil of conductive material having a generally flattened configuration whereby to provide a at least one generally planar surface defined by parallel conductors disposed on the chamber; and apparatus for applying radio frequency energy to the coil.
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| 申请公布号 |
US5280154(A) |
申请公布日期 |
1994.01.18 |
| 申请号 |
US19920828060 |
申请日期 |
1992.01.30 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CUOMO, JEROME J.;GUARNIERI, CHARLES R.;HOPWOOD, JEFFREY A.;WHITEHAIR, STANLEY J. |
| 分类号 |
H01L21/205;C23F4/00;H01J37/32;H01L21/027;H01L21/30;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):B23K9/00 |
主分类号 |
H01L21/205 |
| 代理机构 |
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