| 发明名称 |
METHOD FOR MONITORING SE VAPOR IN VACUUM REACTOR APPARATUS |
| 摘要 |
Methods and systems are disclosed for monitoring vapor in a vacuum reactor apparatus. An system has (a) a vacuum chamber, (b) a vapor source housed in the vacuum chamber, wherein the vapor source is configured to generate a vapor, (c) a reaction vessel housed in the vacuum chamber and coupled to the vapor source, where the reaction vessel has an outlet to the vacuum chamber, and where the reaction vessel is configured to receive the vapor from the vapor source and to emit a portion of the received vapor into the vacuum chamber through the outlet, and (d) one or more sensors housed in the vacuum chamber, where the one or more sensors are configured to detect the vapor emitted through the outlet. |
| 申请公布号 |
US2016273097(A1) |
申请公布日期 |
2016.09.22 |
| 申请号 |
US201415035227 |
申请日期 |
2014.10.16 |
| 申请人 |
NUVOSUN, INC. |
发明人 |
WALL Arthur C.;KAO Sam;KIM John Kwangyong;HACHTMANN Bruce D.;JIANG Qiongzhong;PORTER Karnig Ross Baron |
| 分类号 |
C23C14/54;C23C14/24;C23C14/06 |
主分类号 |
C23C14/54 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A system, comprising:
a vacuum chamber; a vapor source housed in the vacuum chamber, wherein the vapor source is configured to generate a vapor; a reaction vessel housed in the vacuum chamber and coupled to the vapor source, wherein the reaction vessel has an outlet to the vacuum chamber, and wherein the reaction vessel is configured to receive the vapor from the vapor source and to emit a portion of the received vapor into the vacuum chamber through the outlet; and one or more sensors housed in the vacuum chamber, wherein the one or more sensors are configured to detect the vapor emitted through the outlet. |
| 地址 |
Milpitas CA US |
