发明名称 Sputtering cathode for use in vacuum coating installations - mfd. using explosive welding process to produce vacuum-tight seams of cavity for coolant flow
摘要 The sputtering cathode consists of a target (1) and a target baseplate (14) with a cooling bath which jointly form a cavity for coolant flow. The target baseplate (14) and the cooling bath (15) consist of metal sheets which are joined vacuum-tight at the seam by means of an explosive welding process. USE/ADVANTAGE - In vacuum coating installations. Construction of the cathode unit is simplified, and mfg. costs are reduced.
申请公布号 DE4232007(A1) 申请公布日期 1994.03.31
申请号 DE19924232007 申请日期 1992.09.24
申请人 LEYBOLD AG, 63450 HANAU, DE 发明人 SCHEIN, SIEGFRIED, 6467 HASSELROTH, DE;STICKSEL, HANS-PETER, 8755 ALZENAU, DE;JOOS, GERHARD, 8754 GROSSOSTHEIM, DE
分类号 B23K20/08;C23C14/34;H01J37/34;(IPC1-7):C23C14/34 主分类号 B23K20/08
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