发明名称 SHADOW MASK FOR CRT AND MANUFACTURING METHOD FOR THE SAME
摘要 The shadow mask for a cathode ray tube is disclosed in which a shape-memory alloy plate for shadow mask is used having a slit portion memorizing a shape with which an optimal hole for making electron beams pass through is maintained at an average temperature of thermal balance caused due to temperature raised by electron beams.
申请公布号 KR940007136(B1) 申请公布日期 1994.08.06
申请号 KR19910019109 申请日期 1991.10.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, BYONG - SU
分类号 H01J29/07;(IPC1-7):H01J29/07 主分类号 H01J29/07
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