发明名称 |
SHADOW MASK FOR CRT AND MANUFACTURING METHOD FOR THE SAME |
摘要 |
The shadow mask for a cathode ray tube is disclosed in which a shape-memory alloy plate for shadow mask is used having a slit portion memorizing a shape with which an optimal hole for making electron beams pass through is maintained at an average temperature of thermal balance caused due to temperature raised by electron beams.
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申请公布号 |
KR940007136(B1) |
申请公布日期 |
1994.08.06 |
申请号 |
KR19910019109 |
申请日期 |
1991.10.30 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, BYONG - SU |
分类号 |
H01J29/07;(IPC1-7):H01J29/07 |
主分类号 |
H01J29/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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