发明名称 |
Treatment of vent gas to remove hydrogen chloride |
摘要 |
A process for recovering chlorine present in a gaseous vent stream. The process comprises contacting a gaseous vent gas comprising hydrogen chloride and a hydrosilane with a chlorination catalyst to form a more chlorinated silane. The chlorination of the hydrosilane captures the chlorine of the hydrogen chloride as a substituent of the resulting chlorosilane and provides for a readily condensable chlorosilane.
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申请公布号 |
US5401872(A) |
申请公布日期 |
1995.03.28 |
申请号 |
US19940206366 |
申请日期 |
1994.03.07 |
申请人 |
HEMLOCK SEMICONDUCTOR |
发明人 |
BURGIE, RICHARD A.;HENG, OWEN A.;LANGE, TOD E. |
分类号 |
B01D53/86;B01J23/40;B01J23/44;C01B33/107;(IPC1-7):C07F7/08 |
主分类号 |
B01D53/86 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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