发明名称 Treatment of vent gas to remove hydrogen chloride
摘要 A process for recovering chlorine present in a gaseous vent stream. The process comprises contacting a gaseous vent gas comprising hydrogen chloride and a hydrosilane with a chlorination catalyst to form a more chlorinated silane. The chlorination of the hydrosilane captures the chlorine of the hydrogen chloride as a substituent of the resulting chlorosilane and provides for a readily condensable chlorosilane.
申请公布号 US5401872(A) 申请公布日期 1995.03.28
申请号 US19940206366 申请日期 1994.03.07
申请人 HEMLOCK SEMICONDUCTOR 发明人 BURGIE, RICHARD A.;HENG, OWEN A.;LANGE, TOD E.
分类号 B01D53/86;B01J23/40;B01J23/44;C01B33/107;(IPC1-7):C07F7/08 主分类号 B01D53/86
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