发明名称 ESD protection for poly resistor on oxide
摘要 An improved Electrostatic Discharge (ESD) protection device for use in the electrostatic discharge testing of an integrated circuit (IC). In accordance with the invention, a p-n junction is formed beneath a polysilicon resistor, with a metal oxide layer separating the resistor and the p-n junction. The p-n junction is formed by positioning a semiconductor well having a first polarity between the metal oxide and a semiconductor substrate having a second polarity. The invention reduces the electrostatic potential across the metal oxide layer, which could otherwise result in damage to the metal oxide during ESD testing of the IC. In a preferred embodiment, the invention includes a switch, such as a transistor, between the well and ground, for allowing the well to float freely during normal circuit operation (to reduce noise) and for fixing the well at a fixed potential during ESD testing.
申请公布号 US5401997(A) 申请公布日期 1995.03.28
申请号 US19920823764 申请日期 1992.01.22
申请人 INTEGRATED DEVICE TECHNOLOGY, INC. 发明人 LIEN, CHUEN-DER
分类号 H01L27/02;(IPC1-7):H01L33/00 主分类号 H01L27/02
代理机构 代理人
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