发明名称 |
Integrated magnetoresistive sensor fabrication method and apparatus. |
摘要 |
<p>A magnetoresistor is monolithically integrated with active devices (38, 40) by growing a thin film magnetoresistor (28) on a semiconductor substrate (14) after the substrate (14) has been doped and annealed for the active devices (38, 40). The magnetoresistor is made from a material (28) being grown through a window in a mask. The mask material and the magnetoresistor material (28) are selected such that the magnetoresistor is substantially non-adherent to the mask. InSb is preferred for the magnetoresistor material (28), Si3N4 for the mask material (24) and GaAs for the substrate (14). The non-adherence allows the mask to be substantially thinner than the magnetoresistor without impairing the removal of the mask after the magnetoresistor has been established. <IMAGE></p> |
申请公布号 |
EP0656666(A1) |
申请公布日期 |
1995.06.07 |
申请号 |
EP19940118732 |
申请日期 |
1994.11.29 |
申请人 |
HUGHES AIRCRAFT COMPANY |
发明人 |
SOKOLICH, MARKO;YAMASAKI, HIROYUKI;YANG, HUAI-TUNG |
分类号 |
H01L27/22;G01R33/09;H01L43/08;H01L43/12;(IPC1-7):H01L43/12 |
主分类号 |
H01L27/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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