发明名称 Integrated magnetoresistive sensor fabrication method and apparatus.
摘要 <p>A magnetoresistor is monolithically integrated with active devices (38, 40) by growing a thin film magnetoresistor (28) on a semiconductor substrate (14) after the substrate (14) has been doped and annealed for the active devices (38, 40). The magnetoresistor is made from a material (28) being grown through a window in a mask. The mask material and the magnetoresistor material (28) are selected such that the magnetoresistor is substantially non-adherent to the mask. InSb is preferred for the magnetoresistor material (28), Si3N4 for the mask material (24) and GaAs for the substrate (14). The non-adherence allows the mask to be substantially thinner than the magnetoresistor without impairing the removal of the mask after the magnetoresistor has been established. &lt;IMAGE&gt;</p>
申请公布号 EP0656666(A1) 申请公布日期 1995.06.07
申请号 EP19940118732 申请日期 1994.11.29
申请人 HUGHES AIRCRAFT COMPANY 发明人 SOKOLICH, MARKO;YAMASAKI, HIROYUKI;YANG, HUAI-TUNG
分类号 H01L27/22;G01R33/09;H01L43/08;H01L43/12;(IPC1-7):H01L43/12 主分类号 H01L27/22
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