Sulfonium salt and resist composition.

摘要

A sulphonium salt is provided having the formula (1): <CHEM> wherein R<1>, R<2>, and R<3> are independently substituted or unsubstituted aromatic groups, at least one of R<1>, R<2>, and R<3> is a substituted aromatic group having an acid labile group, and at least one of the remaining R groups is a nitrogenous aromatic group, or all of R<1>, R<2>, and R<3> are nitrogenous aromatic groups. A chemically amplified, positive resist composition comprising the sulphonium salt as well as an alkali-soluble resin and a dissolution inhibitor in an organic solvent has solved the PED problem.