发明名称 Antistatic film and method of manufacturing the same
摘要 In a molecule of a monomolecular film, a metal complex is introduced to form an antistatic film. This film is desirably transparent, durable, extremely thin and weakly conductive. The method of manufacturing an antistatic film involves (i) exposing a substrate with an active hydrogen atom thereon to a chemical adsorbent containing a straight carbon-chain group with a silyl group at one end and a phosphonate or carboxyl group at the other end to form a chemically adsorbed monomolecular film, and (ii) soaking the monomolecular film in a solution of a metal salt to form a film containing a complex of the metal element. An antistatic multi-monomolecular film can also be formed by laminating the monomolecular films using hydroxyl groups each bonding to the metal element in each monomolecular film.
申请公布号 US5449554(A) 申请公布日期 1995.09.12
申请号 US19930110704 申请日期 1993.08.20
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 OGAWA, KAZUFUMI
分类号 B32B9/00;B05D1/18;B05D5/12;C08J5/18;C08J7/00;C08J7/04;C09D4/00;C09K3/16;(IPC1-7):B32B7/04 主分类号 B32B9/00
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