摘要 |
<p>A brush cleaning apparatus 10, 10B for cleaning disk-shaped objects W such as wafers, which make it possible to freely adjust a cleaning time and also possible to clean the outermost area of the disk-shaped objects W, which is difficult with traditional brush cleaning apparatuses and a cleaning system for disk-shaped objects W equipped as a part with at least one unit of said invented brush cleaning apparatus 10, 10B. Said brush cleaning apparatus 10, 10B according to the present invention comprises; at least one brush cleaning means 12A, 12B, 13A, 13B each composed of a pair of rotary brushes 12a, 12a', 13a, 13a' being arranged in parallel and spaced apart in one above the other, where disk-shaped objects W are each by each transported through the brushes 12a, 12a', 13a, 13a' and during the time also cleaned; and stopper means 22, 22a installed at a forward distance in the moving direction of the portions of the circumferences of the brushes 12a, 12a', 13a, 13a', where the brushes 12a, 12a', 13a, 13a' contact with the disk-shaped objects W to stop the disk-shaped objects W in place or move them out of the apparatus 10, 10B itself. <MATH></p> |
申请人 |
SHIN-ETSU HANDOTAI COMPANY LIMITED |
发明人 |
UCHIYAMA, ISAO;NAKANO, MASAMI, RYOKUHU-RYO, 1505;TAKAMATU, HIROYUKI;SUZUKI, MORIE |