Photoprotection compositions comprising chelating agents

摘要

The present invention involves photoprotective compositions which are useful for topical application to prevent damage to skin caused by acute or chronic exposure to ultraviolet light comprising chelating agents. Also involved are compositions comprising chelating agents together with anti-inflammatory agents, sunscreening agents, and/or radical scavenging agents. Methods for using such compositions to prevent damage to skin caused by acute or chronic exposure to ultraviolet light are also involved.