发明名称 |
Efficient narrow spectral width soft-X-ray discharge sources |
摘要 |
Methods for making pulsed and continuous discharge plasma light sources for extreme ultraviolet(EUV) projection lithography and soft-x-ray microscopy as well as other applications are disclosed. A first light source of doubly ionized lithium ions emits over a narrow bandwidth of approximately 13.5 nm. A second light source of beryllium ions radiates at approximately 7.60 nm. A third light source of boron ions radiates at approximately 4.86 nm, and a fourth light source of carbon ions radiates at approximately 3.38 nm. Preferred embodiments of apparatus for generating pulsed and continuous discharge sources are disclosed.
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申请公布号 |
US5499282(A) |
申请公布日期 |
1996.03.12 |
申请号 |
US19940237018 |
申请日期 |
1994.05.02 |
申请人 |
UNIVERSITY OF CENTRAL FLORIDA |
发明人 |
SILFVAST, WILLIAM T. |
分类号 |
G03F7/20;H05G2/00;(IPC1-7):H05G2/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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