| 摘要 |
A photo-lithography apparatus comprising an effective illumination source, a condenser lens, a reticle, a projection lens, and an XYZ stage, wherein a reduced image of pattern on the reticle is formed on a substrate disposed on the XYZ stage, and wherein the effective illumination source comprises an aperture stop which is mechanically changeable depending on an illumination mode, the apparatus of the invention characterized further comprising: a photo-detector disposed on the XYZ stage for detecting an image of a specific pattern; a drive mechanism for moving the effective illumination source in X, Y, and Z axis-directions; and circuitry for detecting an off-telecentricity amount of the photo-lithography apparatus and outputting adjustment data to the drive mechanism for moving the effective illumination source, wherein the detecting/outputting circuitry is coupled with the photo-detector, the XYZ stage, and the drive mechanism for moving the effective illumination source, thereby misalignment of the effective illumination source causing the off-telecentricity being corrected.
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