发明名称 |
Laser system for laser ablation process and laser ablation process for preparing thin film of oxide superconductor material thereby |
摘要 |
A laser system comprising a laser oscillator emitting laser beam, and an attenuator disposed on a light path of the laser beam and damping intensity of the laser beam in which intensity of the laser beam can be controlled so as to maintain a required value after the attenuator.
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申请公布号 |
US5544182(A) |
申请公布日期 |
1996.08.06 |
申请号 |
US19940229716 |
申请日期 |
1994.04.19 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
NAGAISHI, TATSUOKI;ITOZAKI, HIDEO |
分类号 |
H01S3/10;B23K26/42;C23C14/28;H01L21/268;(IPC1-7):H01S3/13 |
主分类号 |
H01S3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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