发明名称 |
LASER DICING DEVICE AND METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a laser dicing device and a method, in which laser dicing can be performed with high accuracy since work distance can be made constant and irradiation efficiency can be improved by preventing ablation even when laser dicing is performed on a wafer, especially a thin wafer of 50 μm or less.SOLUTION: A laser dicing device includes: laser irradiation means for irradiating laser beams; a wafer table which is formed so that the laser beams are transmittable therethrough and holds a wafer; and a transparent liquid film located in a gap between a condenser lens surface of the laser irradiation means and the wafer table. The laser irradiation means irradiates the wafer with the laser beams via the wafer table and the liquid film and forms a modified layer inside the wafer.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016195265(A) |
申请公布日期 |
2016.11.17 |
申请号 |
JP20160121635 |
申请日期 |
2016.06.20 |
申请人 |
TOKYO SEIMITSU CO LTD |
发明人 |
FUJITA TAKASHI;SHIMIZU TASUKU |
分类号 |
H01L21/301;B23K26/064;B23K26/10;B23K26/53 |
主分类号 |
H01L21/301 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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