发明名称 Semiconductor wiring spacers for Schottky double diode
摘要 The semiconductor wiring spacer has a semiconductor structure which is a mesa structure formed with two back to back n-p-n structures and having glass protrusions above the outer structure. After the semiconductor structure is formed a thin glass passivation layer 10-20 microns thick is formed on the upper and lower surface. The upper and lower surfaces are then selectively etched using masking techniques, leaving outer wire connection brazing surfaces (31) and protruding glass mounts (30) as well as leaving a side glass section covering (8).
申请公布号 FR2742000(A1) 申请公布日期 1997.06.06
申请号 FR19950014382 申请日期 1995.11.30
申请人 SGS THOMSON MICROELECTRONICS SA 发明人 SALBREUX JEAN CLAUDE
分类号 H01L23/00;H01L23/31;H01L23/495;H01L29/06;(IPC1-7):H01L29/417;H01L29/87 主分类号 H01L23/00
代理机构 代理人
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