| 发明名称 |
Selective planarization apparatus |
| 摘要 |
Technique and apparatus for planarizing microsteps on a substrate by compressing the surface to be smoothed against a frozen layer of an etchant, where the compressive force is sufficient to melt the etchant at the contact edges between said microsteps and said etchant.
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| 申请公布号 |
US5645675(A) |
申请公布日期 |
1997.07.08 |
| 申请号 |
US19940241847 |
申请日期 |
1994.05.12 |
| 申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
GUPTA, SUBHASH |
| 分类号 |
B24B37/04;H01L21/306;H01L21/3105;(IPC1-7):H01L21/00 |
主分类号 |
B24B37/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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