| 摘要 |
While a mask is illuminated under a predetermined illumination condition to transfer the image of the pattern of the mask to a substrate, the amount of imaging characteristic change of a projection optical system is calculated by the use of calculation parameters corresponding to the illumination condition, and the imaging characteristics are adjusted based on the calculated amount. Further, when the pattern on the mask or the illumination condition is changed, the amount of imaging characteristic change is calculated based on an amount of energy stored in the projection optical system prior to the changing of the condition, pattern exposure is started immediately after the changing of the condition, and the imaging characteristics are adjusted based on the calculated amount.
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