发明名称 |
SHOWERHEAD FOR UNIFORM DISTRIBUTION OF PROCESS GAS |
摘要 |
A showerhead (370) includes a plurality of gas inlets (360) for supplying process gas to a semiconductor substrate surface (108) and a plurality of gas outlets (362) for removing gas and volatile byproducts produced as a result of reaction of the process gas with the substrate surface. Each gas inlet is concentrically positioned within a respective gas outlet. The showerhead improves the utilization of process gas species at the substrate surface by providing gas flow in a direction perpendicular to the substrate surface and avoiding flow of the process gas or volatile byproducts laterally across the substrate surface. The showerhead is useful for uniform stripping of a mask of organic material by direct contact of the incoming reactive gas with the substrate surface and immediate removal of the process gas and volatile byproducts through the concentrically arranged gas outlets.
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申请公布号 |
WO9737059(A1) |
申请公布日期 |
1997.10.09 |
申请号 |
WO1997US04933 |
申请日期 |
1997.03.27 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
WILLIAMS, NORMAN |
分类号 |
H01L21/302;C23C16/44;C23C16/455;C23F4/00;H01J37/32;H01L21/00;H01L21/3065;(IPC1-7):C23C16/44 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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