RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN,申请号WO2016JP58519-传众专利搜索

发明名称	RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
摘要	A resist base material containing a compound having a specified structure, and/or a resin obtained using the compound as a monomer.
申请公布号	WO2016158458(A1)	申请公布日期	2016.10.06
申请号	WO2016JP58519	申请日期	2016.03.17
申请人	MITSUBISHI GAS CHEMICAL COMPANY, INC.	发明人	TOIDA, Takumi;ECHIGO, Masatoshi;SATO, Takashi;SHIMIZU, Youko
分类号	G03F7/004;C08G83/00	主分类号	G03F7/004
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