| 发明名称 |
BASE FOR HALOGENSILVER LIGHT-SENSITIVE MATERIAL WITH REMOVABLE EMULSION LAYER |
| 摘要 |
FIELD: chemical-and- photographic industry; mapping. SUBSTANCE: base consisting of flexible substrate with polymeric sublayer applied on it is proposed for separation of dry emulsion layer and simplification of material manufacturing technology. Polymeric sublayer is made of partially saponified polyvinyl butyral (saponification fraction is from 7 to 30 per cent). EFFECT: enhanced manufacturing process.
|
| 申请公布号 |
RU2110825(C1) |
申请公布日期 |
1998.05.10 |
| 申请号 |
RU19950111639 |
申请日期 |
1995.07.06 |
| 申请人 |
AKTSIONERNOE OBSHCHESTVO ZAKRYTOGO TIPA "POZITIV" |
发明人 |
VELINZON P.Z.;GAFT S.I.;SHAMSHEVA T.I.;DEMIDOV K.B.;KISELEV A.JA.;FALEV O.V.;VELINZON P.Z.;GAFT S.I.;SHAMSHEVA T.I.;DEMIDOV K.B.;KISELEV A.JA.;FALEV O.V. |
| 分类号 |
G03C1/805;(IPC1-7):G03C1/805 |
主分类号 |
G03C1/805 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
