发明名称 METHOD OF REMOVING TRACES OF GASEOUS IMPURITIES FROM INERT GASES
摘要 FIELD: gas treatment. SUBSTANCE: method involves breakdown of impurities at 850-950 C, while simultaneously absorbing carbon, nitrogen, oxygen, and breakdown products on activated titanium metal. Preliminarily, more degradable oxygen-containing impurities are broken down at 750-800 C, while absorbing released oxygen, and, after carbon, nitrogen, and oxygen are absorbed, hydrogen is absorbed at 350-400 C. EFFECT: enhanced gas purification efficiency. 2 cl, 1 dwge
申请公布号 RU2113270(C1) 申请公布日期 1998.06.20
申请号 RU19960114744 申请日期 1996.08.06
申请人 TEKHNOTSENTR "LAZERNAJA DIAGNOSTIKA I CHISTYE TEKH 发明人 VOVK S.M.;EFIMOV V.V.;KOZLOV P.M.;KOSHELEV V.L.;PEREKHOZHEVA T.N.;SHCHERBAKOV A.G.
分类号 B01D53/04 主分类号 B01D53/04
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