| 摘要 |
PROBLEM TO BE SOLVED: To provide plasma processing apparatus and method that can enhance the yield of products when a substrate held on a transfer carrier is subjected to plasma processing.SOLUTION: A plasma processing apparatus includes a reaction chamber, a plasma generator for generating plasma in the reaction chamber, a stage which is disposed inside the reaction chamber to mount thereon a transfer carrier having a substrate, a holding sheet and a frame, an electrostatic adsorption mechanism having an electrode portion provided inside the stage, a support portion for supporting the transfer carrier between a mount position on the stage and a delivery position spaced upward from the stage, and an elevating mechanism for moving the support portion upwards and downwards relatively to the stage. When the transfer carrier is mounted on the stage, the outer peripheral portion of the holding sheet contacts the stage, and then the electrostatic adsorption mechanism applies a voltage to the electrode portion. The application of the voltage contains an operation of increasing or decreasing the absolute value of the voltage, and after the above operation is completed, the plasma generator generates plasma.SELECTED DRAWING: Figure 2 |
