发明名称 BLOCK COPOLYMER, SURFACE PREPARATION AGENT, FILM THEREOF, AND CELL CULTURE SUBSTRATE COATED THEREWITH
摘要 PROBLEM TO BE SOLVED: To provide a coating film for a cell culture substrate enabling cell peeling by a short-time low-temperature treatment, and enabling highly-efficient cell culture; and to provide a production method thereof.SOLUTION: A block copolymer has a structural unit expressed in formula (1), and a structural unit having a phosphate group and a tertiary amine group in a molecule. A film is obtained by applying onto a substrate, a surface preparation agent for the substrate for cell culture containing a block copolymer having the number average molecular weight of 5,000-1,000,000 and a solvent.SELECTED DRAWING: None
申请公布号 JP2016193976(A) 申请公布日期 2016.11.17
申请号 JP20150073861 申请日期 2015.03.31
申请人 TOSOH CORP;UNIV OF TOKYO 发明人 IMATOMI SHINYA;YAMADA SATORU;ISHIHARA KAZUHIKO
分类号 C08F293/00;C12M3/00 主分类号 C08F293/00
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