发明名称 PROCESS FOR PREPARING POLYSILICON USING EXOTHERMIC REACTION
摘要 The disclosure describes a process for the preparation of polysilicon by a thermal decomposition or hydrogen reduction of a reaction gas including a silane gas, which comprises introducing hydrogen chloride into a reactor in addition to the reaction gas and utilizing within the reactor the heat of reaction generated from the reaction between the hydrogen chloride and silicon as an additional heat source.
申请公布号 WO9840543(A1) 申请公布日期 1998.09.17
申请号 WO1998KR00027 申请日期 1998.02.13
申请人 KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY;KIM, HEE, YOUNG 发明人 KIM, HEE, YOUNG
分类号 C01B33/03;C01B33/035;C30B25/02 主分类号 C01B33/03
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