摘要 |
In a complementary transistor pair, the two transistors are arranged one above the other in the growth direction and the upper and lower layers of the transistor layer sequences form the respective gate regions of the first and second transistors. Also claimed is a process for producing the basic structure of a complementary transistor pair by successively forming a lower gate region layer, an insulating layer, a p-channel layer, an insulating layer, an n-channel layer, an insulating layer and an upper gate region. Further claimed are processes for producing a complementary transistor pair.
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申请人 |
MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V., 80539 MUENCHEN, DE |
发明人 |
RUBEL, HOLGER, 74736 HARDHEIM, DE;FISCHER, ALBRECHT, 74369 LOECHGAU, DE;DIETSCHE, WERNER, 71120 GRAFENAU, DE;EBERL, KARL, 71263 WEIL DER STADT, DE |