| 摘要 |
A body of the exposure device including a lighting optical system 2 through a wafer stage 8 is contained in a constant temperature room 100 of a chamber 1. A gas A2 whose temperature has risen by the heat generated by the body of the exposure device is supplied from the constant temperature room 100 to the fluid supply device 11 mounted on the floor below the floor of the chamber 1 through the exhaust duct 17. The temperature of the gas A2 is then adjusted at a predetermined temperature, and the gas is supplied to the blow duct 16. The supplied gas A4 is led into the temperature control room 23 mounted on the ceiling of the chamber, and a Peltier element 18 inside the temperature control room 23 correctly adjusts the temperature into a target temperature. Thus, a gas A5 set at a constant temperature is blown into the constant temperature room 100 through a dust filter 21 in a filter room 22b. Thus, the temperature of the chamber 1 can be set at a constant temperature with high precision without transmitting the vibration generated during the temperature control to the exposure apparatus containing the body of the exposure device in the chamber 1. <IMAGE> |
